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10-NM LINEWIDTH ELECTRON-BEAM LITHOGRAPHY ON GAAS
被引:126
作者
:
CRAIGHEAD, HG
论文数:
0
引用数:
0
h-index:
0
CRAIGHEAD, HG
HOWARD, RE
论文数:
0
引用数:
0
h-index:
0
HOWARD, RE
JACKEL, LD
论文数:
0
引用数:
0
h-index:
0
JACKEL, LD
MANKIEWICH, PM
论文数:
0
引用数:
0
h-index:
0
MANKIEWICH, PM
机构
:
来源
:
APPLIED PHYSICS LETTERS
|
1983年
/ 42卷
/ 01期
关键词
:
D O I
:
10.1063/1.93757
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:38 / 40
页数:3
相关论文
共 4 条
[1]
SUB-20-NM-WIDE METAL LINES BY ELECTRON-BEAM EXPOSURE OF THIN POLY(METHYL METHACRYLATE) FILMS AND LIFTOFF
BEAUMONT, SP
论文数:
0
引用数:
0
h-index:
0
BEAUMONT, SP
BOWER, PG
论文数:
0
引用数:
0
h-index:
0
BOWER, PG
TAMAMURA, T
论文数:
0
引用数:
0
h-index:
0
TAMAMURA, T
WILKINSON, CDW
论文数:
0
引用数:
0
h-index:
0
WILKINSON, CDW
[J].
APPLIED PHYSICS LETTERS,
1981,
38
(06)
: 436
-
439
[2]
RESOLUTION LIMITS OF PMMA RESIST FOR EXPOSURE WITH 50 KV ELECTRONS
BROERS, AN
论文数:
0
引用数:
0
h-index:
0
BROERS, AN
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1981,
128
(01)
: 166
-
170
[3]
250-A LINEWIDTHS WITH PMMA ELECTRON RESIST
BROERS, AN
论文数:
0
引用数:
0
h-index:
0
BROERS, AN
HARPER, JME
论文数:
0
引用数:
0
h-index:
0
HARPER, JME
MOLZEN, WW
论文数:
0
引用数:
0
h-index:
0
MOLZEN, WW
[J].
APPLIED PHYSICS LETTERS,
1978,
33
(05)
: 392
-
394
[4]
50-NM SILICON STRUCTURES FABRICATED WITH TRILEVEL ELECTRON-BEAM RESIST AND REACTIVE-ION ETCHING
JACKEL, LD
论文数:
0
引用数:
0
h-index:
0
JACKEL, LD
HOWARD, RE
论文数:
0
引用数:
0
h-index:
0
HOWARD, RE
HU, EL
论文数:
0
引用数:
0
h-index:
0
HU, EL
TENNANT, DM
论文数:
0
引用数:
0
h-index:
0
TENNANT, DM
GRABBE, P
论文数:
0
引用数:
0
h-index:
0
GRABBE, P
[J].
APPLIED PHYSICS LETTERS,
1981,
39
(03)
: 268
-
270
←
1
→
共 4 条
[1]
SUB-20-NM-WIDE METAL LINES BY ELECTRON-BEAM EXPOSURE OF THIN POLY(METHYL METHACRYLATE) FILMS AND LIFTOFF
BEAUMONT, SP
论文数:
0
引用数:
0
h-index:
0
BEAUMONT, SP
BOWER, PG
论文数:
0
引用数:
0
h-index:
0
BOWER, PG
TAMAMURA, T
论文数:
0
引用数:
0
h-index:
0
TAMAMURA, T
WILKINSON, CDW
论文数:
0
引用数:
0
h-index:
0
WILKINSON, CDW
[J].
APPLIED PHYSICS LETTERS,
1981,
38
(06)
: 436
-
439
[2]
RESOLUTION LIMITS OF PMMA RESIST FOR EXPOSURE WITH 50 KV ELECTRONS
BROERS, AN
论文数:
0
引用数:
0
h-index:
0
BROERS, AN
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1981,
128
(01)
: 166
-
170
[3]
250-A LINEWIDTHS WITH PMMA ELECTRON RESIST
BROERS, AN
论文数:
0
引用数:
0
h-index:
0
BROERS, AN
HARPER, JME
论文数:
0
引用数:
0
h-index:
0
HARPER, JME
MOLZEN, WW
论文数:
0
引用数:
0
h-index:
0
MOLZEN, WW
[J].
APPLIED PHYSICS LETTERS,
1978,
33
(05)
: 392
-
394
[4]
50-NM SILICON STRUCTURES FABRICATED WITH TRILEVEL ELECTRON-BEAM RESIST AND REACTIVE-ION ETCHING
JACKEL, LD
论文数:
0
引用数:
0
h-index:
0
JACKEL, LD
HOWARD, RE
论文数:
0
引用数:
0
h-index:
0
HOWARD, RE
HU, EL
论文数:
0
引用数:
0
h-index:
0
HU, EL
TENNANT, DM
论文数:
0
引用数:
0
h-index:
0
TENNANT, DM
GRABBE, P
论文数:
0
引用数:
0
h-index:
0
GRABBE, P
[J].
APPLIED PHYSICS LETTERS,
1981,
39
(03)
: 268
-
270
←
1
→