SUB-20-NM-WIDE METAL LINES BY ELECTRON-BEAM EXPOSURE OF THIN POLY(METHYL METHACRYLATE) FILMS AND LIFTOFF

被引：56

作者：

BEAUMONT, SP

BOWER, PG

TAMAMURA, T

WILKINSON, CDW

机构：

来源：

APPLIED PHYSICS LETTERS | 1981年 / 38卷 / 06期

关键词：

D O I：

10.1063/1.92388

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：436 / 439

页数：4

共 9 条

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