ION-BEAM EXPOSURE PROFILES IN PMMA-COMPUTER SIMULATION

被引：67

作者：

KARAPIPERIS, L ^{[1
]}

ADESIDA, I ^{[1
]}

LEE, CA ^{[1
]}

WOLF, ED ^{[1
]}

机构：

[1] CORNELL UNIV,SCH ELECT ENGN,ITHACA,NY 14853

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571256

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1259 / 1263

页数：5

共 13 条

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[6] 400-A HIGH ASPECT-RATIO LINES PRODUCED IN POLYMETHYL METHACRYLATE (PMMA) BY ION-BEAM EXPOSURE
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[7] KARAPIPERIS L, 1981, THESIS CORNELL U
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[9] Lindhard J., 1963, MAT FYS MEDD K DAN V, V33, P31
[10] ELECTRON-BEAM RESIST EDGE PROFILE SIMULATION
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