PROCESS STUDY OF CHEMICALLY VAPOUR-DEPOSITED SNOX (X-ALMOST-EQUAL-TO-2) FILMS

被引：29

作者：

LOU, JC

LIN, MS

CHYI, JI

SHIEH, JH

机构：

来源：

THIN SOLID FILMS | 1983年 / 106卷 / 03期

关键词：

D O I：

10.1016/0040-6090(83)90478-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

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页码：163 / 173

页数：11

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