HIGH-RATE DC REACTIVELY SPUTTERED METAL-OXY-FLUORINE DIELECTRIC MATERIALS

被引：15

作者：

HARDING, GL ^{[1
]}

机构：

[1] CHALMERS UNIV TECHNOL,DEPT PHYS,S-41296 GOTHENBURG,SWEDEN

来源：

关键词：

D O I：

10.1016/0040-6090(86)90400-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：279 / 287

页数：9

共 9 条

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[4] ANTIREFLECTION OF SPUTTERED HEAT MIRROR AND TRANSPARENT CONDUCTING COATINGS BY METAL-OXY-FLUORINE FILMS
HARDING, GL
HAMBERG, I
GRANQVIST, CG
[J]. SOLAR ENERGY MATERIALS, 1985, 12 (03): : 187 - 198
[5] PRODUCTION AND PROPERTIES OF HIGH-RATE SPUTTERED LOW INDEX TRANSPARENT DIELECTRIC MATERIALS BASED ON ALUMINUM-OXY-FLUORINE
HARDING, GL
[J]. SOLAR ENERGY MATERIALS, 1985, 12 (03): : 169 - 186
[6] METAL-CONTAINING FLUOROPOLYMER FILMS PRODUCED BY SIMULTANEOUS PLASMA-ETCHING AND POLYMERIZATION - EFFECTS OF HYDROGEN OR OXYGEN
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[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (11) : 5678 - 5687
[7] THORNTON JA, 1979, DEV SELECTIVE SURFAC
[8] Vossen J.L., 1978, THIN FILM PROCESSES
[9] ZHIQIANG Y, 1984, THIN SOLID FILMS, V120, P81