EFFECT OF CVD PROCESS PARAMETERS ON PHASE AND CHEMICAL-COMPOSITION OF BSCCO THIN-FILMS

被引：4

作者：

FUFLYIGIN, VN

KAUL, AR

POZIGUN, SA

机构：

[1] Moscow State Univ., Moscow

来源：

JOURNAL DE PHYSIQUE IV | 1993年 / 3卷 / C3期

关键词：

D O I：

10.1051/jp4:1993349

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Superconducting BSCCO thin films were obtained with high deposition rate (about 35 nm/min) at temperatures of 720-810-degrees-C by MOCVD-technique. Characteristics of evaporation process of precursors were determined. The influence of deposition temperature and oxygen partial pressure on superconducting phase formation and chemical composition of the films was studied.

引用

页码：361 / 366

页数：6

共 13 条

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