ETCH PITS AND TUNNEL BARRIER IN CHEMICALLY ETCHED YBA2CU3O7-DELTA CRYSTALS BY SCANNING TUNNELING MICROSCOPY

被引:6
作者
BALZAROTTI, A
PATELLA, F
MOTTA, N
CUCOLO, A
DILEO, R
DECRESCENZI, M
机构
[1] UNIV SALERNO,DIPARTIMENTO FIS,I-84081 BARONISSI,ITALY
[2] UNIV CAMERINO,DIPARTIMENTO MATEMAT & FIS,I-62032 CAMERINO,ITALY
来源
PHYSICA C | 1992年 / 200卷 / 3-4期
关键词
D O I
10.1016/0921-4534(92)90374-L
中图分类号
O59 [应用物理学];
学科分类号
摘要
By imaging in air the (001) surfaces of YBa2Cu3O7-delta single crystals etched in dilute CH3OH:Br2 solution with scanning tunneling microscopy we have observed etch pits and followed their modification with time. The current-voltage characteristics of the junction are measured and described in terms of electron tunneling through a trapezoidal potential barrier of average thickness (approximately 25 angstrom). Such a barrier results from the passivated layer formed on the superconductor surface exposed to room air after the etching. The superconductor surface is metallic. The normalized conductance G(V) measured at room temperature is that of a metal-insulator-metal junction except at small bias. Sharp peaks assigned to local density-of-states features within 1 eV from the Fermi level are observed.
引用
收藏
页码:251 / 256
页数:6
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