DEPOSITION OF ATOMS SPUTTERED IN AN ABNORMAL GLOW DISCHARGE

被引:8
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MASE, H
NAKAYA, S
HATTA, Y
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10.1063/1.1710032
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O59 [应用物理学];
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页码:2960 / &
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[1]  
FETZ AJ, 1963, 6 P I C ION PHEN GAS, V4, P39
[2]  
HATTA Y, 1963, J BRIT IRE, V26, P383
[3]  
KOEDAM M, 1961, PHILIPS RES REP, V16, P101
[4]  
KOEDAM M, 1961, PHILIPS RES REP, V16, P266
[5]   SPUTTERING YIELDS OF METALS FOR AR+ AND NE+ IONS WITH ENERGIES FROM 50 TO 600 EV [J].
LAEGREID, N ;
WEHNER, GK .
JOURNAL OF APPLIED PHYSICS, 1961, 32 (03) :365-&
[6]  
PENNING FM, 1946, PHILIPS RES REP, V1, P119
[7]  
Stocker B. J., 1961, BRIT J APPL PHYS, V12, P465
[8]  
WATANABE Y, 1952, J I ELEC ENGRS JAPAN, V72, P611