MASS-SPECTROMETRIC TRANSIENT STUDY OF DC PLASMA-ETCHING OF SI IN NF3 AND NF3/O2 MIXTURES

被引：19

作者：

HONDA, T

BRANDT, WW

机构：

[1] UNIV WISCONSIN,DEPT CHEM,MILWAUKEE,WI 53201

[2] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53201

来源：

关键词：

D O I：

10.1149/1.2115379

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2667 / 2670

页数：4

共 13 条

BEATTIE, WH .

[2]

BEENAKKER CIM, 1981, ELECTROCHEMICAL SOC, P302

[3]

BRANDT WW, UNPUB PLASMA CHEM PL

[4]

BRANDT WW, 1983, 6TH P INT S PLASM CH, P604

CHUANG, TJ .

[6]

Coburn J.W., 1982, PLASMA CHEM PLASMA P, V2, P1, DOI 10.1007/BF00566856

[7]

CORNU A, 1975, COMPILATION MASS SPE, V1

[8]

DAGOSTINO R, COMMUNICATION

[9]

DAGOSTINO R, 1981, PLASMA CHEM PLASMA P, V1, P365

[10] DISSOCIATION OF SF6, CF4, AND SIF4 BY ELECTRON IMPACT [J].

DIBELER, VH ;

MOHLER, FL .

JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1948, 40 (01) :25-29