TIME-OF-FLIGHT HEAVY-ION BACKSCATTERING SPECTROMETRY

被引：11

作者：

KNAPP, JA

BANKS, JC

DOYLE, BL

机构：

[1] Sandia National Laboratories, Albuquerque

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1994年 / 85卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(94)95777-0

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A new time-of-flight (TOF) ion detection system for heavy ion backscattering spectrometry (HIBS) is described and examples are given of the use of the system for measuring low-level contamination on Si wafers. Currently, the TOF-HIBS system has a sensitivity of 1 x 10(9)/cm2 for the heaviest of surface impurity atoms and a mass resolution capable of separating Fe from Cu. The sensitivity is expected to improve by an additional order of magnitude with three parallel detectors in an optimized configuration.

引用

收藏

页码：20 / 23

页数：4

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