PREFERENTIAL SPUTTERING OF ARGON ION-BOMBARDED NI3AL AND TASI2

被引：15

作者：

HOFMANN, S

STEPANOVA, MG

机构：

[1] RUSSIAN ACAD SCI,MV KELDYSH APPL MATH INST,MOSCOW 125047,RUSSIA

[2] MAX PLANCK INST MET RES,INST WERKSTOFFWISSENSCH,D-70174 STUTTGART,GERMANY

来源：

APPLIED SURFACE SCIENCE | 1995年 / 90卷 / 02期

关键词：

D O I：

10.1016/0169-4332(95)00063-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The effect of the preferential sputtering of Ni3Al and TaSi2 under Ar+ ion bombardment in the energy range of 0.1-4.0 keV is studied by numerical solution of master equations for linear, binary-collision cascades. Results of the calculations are compared to the analytical theory of the preferential sputtering. By such a way, the field of application of the theory is elucidated. Calculations for both low-fluence and high-fluence cases are performed. Main features of composition-depth profiles generated in Ni3Al and TaSi2 by argon bombardment are briefly discussed.

引用

页码：227 / 233

页数：7

共 26 条

[1] STOICHIOMETRY EFFECTS AT NIMO SURFACES UNDER BOMBARDMENT WITH AR+ IONS FROM 40 TO 2000 EV [J].