TIN DOPING OF GALLIUM-ARSENIDE BY METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION (MOCVD)

被引:15
作者
PARSONS, JD
KRAJENBRINK, FG
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关键词
D O I
10.1149/1.2120093
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:1780 / 1781
页数:2
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共 2 条
[1]   NUCLEATION EFFECTS DURING MBE GROWTH OF SN-DOPED GAAS [J].
HARRIS, JJ ;
JOYCE, BA ;
GOWERS, JP ;
NEAVE, JH .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1982, 28 (01) :63-71
[2]  
WANG CS, 1968, PHYS SOC C SER, V7, P18