PLASMA ORGANO-SILICON POLYMERS - DEPOSITION, CHARACTERIZATION, AND APPLICATION IN MULTILAYER RESIST

被引：32

作者：

NGUYEN, VS

UNDERHILL, J

FRIDMANN, S

PAN, P

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 08期

关键词：

D O I：

10.1149/1.2114255

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：1925 / 1932

页数：8

相关论文

共 21 条

[1] AKIK M, 1980, J APPL PHYS, V51, P5055
[2] PLASMA POLYMERIZATION OF HEXAMETHYLDISILOXANE IN THE GAS-PHASE .1. POLYMERIZATION STUDIES
AKOVALI, G
BOLUK, MY
[J]. POLYMER ENGINEERING AND SCIENCE, 1981, 21 (11) : 658 - 661
[3] NEW METHOD OF GAAS PASSIVATION WITH THIN POLYMER-FILMS
BROSSET, D
AI, B
SEGUI, Y
[J]. APPLIED PHYSICS LETTERS, 1978, 33 (01) : 87 - 89
[4] Franco J. R., 1977, US Patent, Patent No. 4004044
[5] A VLSI BIPOLAR METALLIZATION DESIGN WITH 3-LEVEL WIRING AND AREA ARRAY SOLDER CONNECTIONS
FRIED, LJ
HAVAS, J
LECHATON, JS
LOGAN, JS
PAAL, G
TOTTA, PA
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1982, 26 (03) : 362 - 371
[6] IONIC SPECIES IN A SILANE PLASMA
HALLER, I
[J]. APPLIED PHYSICS LETTERS, 1980, 37 (03) : 282 - 284
[7] HALLER I, 1981, J ELCHEM SO, V129, P180
[8] HAYS AK, 1980, THIN SOLID FILMS, V84, P401
[9] SOME SURFACE-PROPERTIES OF PLASMA POLYMERS PREPARED FROM HEXAMETHYLDISILAZANE AND DIETHYLAMINOTRIMETHYLSILANE
HIROTSU, T
[J]. JOURNAL OF APPLIED POLYMER SCIENCE, 1979, 24 (09) : 1957 - 1964
[10] ADVANCES IN DEPOSITION PROCESSES FOR PASSIVATION FILMS
KERN, W
ROSLER, RS
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (05): : 1082 - 1099