EFFECTS OF IMPLANTATION AND ANNEALING TEMPERATURES ON IMPLANTATION INDUCED DAMAGE IN HGCDTE

被引：17

作者：

WU, SY ^{[1
]}

CHOYKE, WJ ^{[1
]}

TAKEI, WJ ^{[1
]}

NOREIKA, AJ ^{[1
]}

FRANCOMBE, MH ^{[1
]}

IRWIN, RB ^{[1
]}

机构：

[1] UNIV PITTSBURGH,PITTSBURGH,PA 15260

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 01期

关键词：

D O I：

10.1116/1.571729

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：255 / 258

页数：4

共 9 条

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