INTERSTITIAL DIFFUSION OF HE IN NICKEL

被引:28
作者
PHILIPPS, V [1 ]
SONNENBERG, K [1 ]
机构
[1] FORSCHUNGSZENTRUM JULICH, INST FESTKORPERFORSCH, D-5170 JULICH 1, FED REP GER
关键词
D O I
10.1016/0022-3115(83)90076-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:95 / 97
页数:3
相关论文
共 9 条
[1]  
AMANO J, J APPL PHYS, V52, P6934
[2]  
COST JR, 1974, J VAC SCI TECHNOL, V12, P516
[3]   KINETICS OF DESORPTION OF HELIUM IMPLANTED INTO A NICKEL (100) CRYSTAL [J].
EDWARDS, D ;
KORNELSEN, EV .
SURFACE SCIENCE, 1974, 44 (01) :1-10
[4]  
MELIUS CF, 1980, MAR HARW CONS S IN R, P14
[5]   DIFFUSION OF HELIUM IN NICKEL [J].
PHILIPPS, V ;
SONNENBERG, K ;
WILLIAMS, JM .
JOURNAL OF NUCLEAR MATERIALS, 1982, 107 (2-3) :271-279
[6]  
POKER DB, UNPUB APPL PHYS LETT
[7]  
THOMAS GJ, 1979, J APPL PHYS, V50, P11
[8]   RANGE PROFILES OF 300-EV AND 475-EV HE-4(+) IONS AND THE DIFFUSIVITY OF HE-4 IN TUNGSTEN [J].
WAGNER, A ;
SEIDMAN, DN .
PHYSICAL REVIEW LETTERS, 1979, 42 (08) :515-518
[9]  
WILSON WD, FUNDAMENTAL ASPECTS, P1025