RANGE PROFILES OF 300-EV AND 475-EV HE-4(+) IONS AND THE DIFFUSIVITY OF HE-4 IN TUNGSTEN

被引：79

作者：

WAGNER, A ^{[1
]}

SEIDMAN, DN ^{[1
]}

机构：

[1] CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853

来源：

PHYSICAL REVIEW LETTERS | 1979年 / 42卷 / 08期

关键词：

D O I：

10.1103/PhysRevLett.42.515

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Range profiles for 300- and 475-eV He+4 ions implanted in situ in tungsten at 60, 61, 80, 90 K were measured, directly and absolutely, employing an atom-probe field-ion microscope. A mean range (x̄) of 40 ± 4 and a parent standard deviation (σ) of 20 to 36 was obtained for 300-eV He+4; values of x̄ and σ of 56 ± 6 and 37 to 42 , respectively, were determined for 475-eV He+4. The existence of an isolated and immobile interstitial He4 atom was established and an enthalpy change of migration of 0.24 and 0.32 eV was determined. © 1979 The American Physical Society.

引用

页码：515 / 518

页数：4

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