X-RAY PHOTOELECTRON AND AUGER-ELECTRON FORWARD SCATTERING - A STRUCTURAL PROBE FOR STUDYING ULTRATHIN EPITAXIAL-FILMS AND INTERFACES

被引:9
作者
EGELHOFF, WF
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期
关键词
D O I
10.1116/1.573805
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
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页码:758 / 759
页数:2
相关论文
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