MULTICOINCIDENCE MASS-SPECTROMETRY APPLIED TO HEXAMETHYLDISILANE EXCITED AROUND THE SI 2P EDGE

被引:85
作者
SIMON, M
LEBRUN, T
MARTINS, R
DESOUZA, GGB
NENNER, I
LAVOLLEE, M
MORIN, P
机构
[1] CENS,CEA,DRECAM,SPAM,F-91191 GIF SUR YVETTE,FRANCE
[2] UFRJ,INST QUIM,BR-21910 RIO JANEIRO,BRAZIL
[3] ARGONNE NATL LAB,DIV PHYS,ARGONNE,IL 60439
关键词
D O I
10.1021/j100122a011
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Photoelectron-photoion-photoion coincidence (PEPIPICO) mass spectrometry is applied to Si 2p core ionization. The ion yield spectrum is compared to the spectrum of the tetramethylsilane molecule in order to point out resonances due to the Si-Si chemical bond. Simple coincidence mass spectra are dominated by the SiC3H9+ fragment ion and do not show a strong dependence on photon wavelength. PEPIPICO spectra demonstrate that dissociation dynamics is dominated by stepwise fragmentation of SiC3H9+ and that double ionization always involves Si-Si chemical bond rupture, shown to be faster than the Si-C rupture. We discuss the results in term of a fast decay of Si-Si into singly and doubly charged molecules followed by a cascade of slow fragmentation and isomerization Of SiC3H9+.
引用
收藏
页码:5228 / 5237
页数:10
相关论文
共 31 条
[1]  
AKSELA H, IN PRESS PHYS SCR
[2]  
Baer T., 1986, ADV CHEM PHYS, V64, P111
[3]   INTRAMOLECULAR ELECTRON LOCALIZATION AND LOCAL-DENSITY CALCULATIONS ON SILICON-CONTAINING MOLECULES - TETRAMETHYLSILANE AND HEXAMETHYLDISILANE [J].
BERKOVITCHYELLIN, Z ;
ELLIS, DE ;
RATNER, MA .
CHEMICAL PHYSICS, 1981, 62 (1-2) :21-35
[4]   SINGLE-ELECTRON AND MULTIPLE-ELECTRON EFFECTS IN THE SI 1S PHOTOABSORPTION SPECTRA OF SIX4 (X=H,D,F,CL,BR,CH3,C2H5,OCH3,OC2H5) MOLECULES - EXPERIMENT AND THEORY [J].
BODEUR, S ;
MILLIE, P ;
NENNER, I .
PHYSICAL REVIEW A, 1990, 41 (01) :252-263
[5]   MASS SPECTRA OF ORGANOMETALLIC COMPOUNDS [J].
CHAMBERS, DB ;
GLOCKLIN.F ;
LIGHT, JRC .
QUARTERLY REVIEWS, 1968, 22 (03) :317-&
[6]   ON MASS SPECTRA OF SOME ALKYL DIGERMANIUM COMPOUNDS [J].
DERIDDER, JJ ;
DIJKSTRA, G .
ORGANIC MASS SPECTROMETRY, 1968, 1 (05) :647-&
[7]   RELAXATION PROCESSES FOLLOWING EXCITATION AND IONIZATION OF SIF4 IN THE VICINITY OF THE SILICON 2P THRESHOLD .1. ELECTRONIC RELAXATION PROCESSES [J].
DESOUZA, GGB ;
MORIN, P ;
NENNER, I .
JOURNAL OF CHEMICAL PHYSICS, 1989, 90 (12) :7071-7077
[8]   RELAXATION PROCESSES OF RESONANCES IN SIH4 IN THE VICINITY OF THE SILICON 2P THRESHOLD [J].
DESOUZA, GGB ;
MORIN, P ;
NENNER, I .
PHYSICAL REVIEW A, 1986, 34 (06) :4770-4776
[9]   SITE-SPECIFIC FRAGMENTATION OF SMALL MOLECULES FOLLOWING SOFT-X-RAY EXCITATION [J].
EBERHARDT, W ;
SHAM, TK ;
CARR, R ;
KRUMMACHER, S ;
STRONGIN, M ;
WENG, SL ;
WESNER, D .
PHYSICAL REVIEW LETTERS, 1983, 50 (14) :1038-1041
[10]  
Eland J. H. D., 1989, ACCOUNTS CHEM RES, V22, P281