LEED STUDY OF GROWTH OF ALUMINUM FILMS ON TA(110)SURFACE

被引：12

作者：

JACKSON, AG

HOOKER, MP

HAAS, TW

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1967年 / 38卷 / 13期

关键词：

D O I：

10.1063/1.1709267

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4998 / &

共 13 条

[1] CALCULATIONS ON THE WAVELENGTH DEPENDENCE OF THE INTENSITY OF BACK-REFLECTED ELECTRONS FROM NICKEL (111) [J].

GAFNER, G .

SURFACE SCIENCE, 1964, 2 :534-543

[2]

GERMER LH, 1963, ANN NY ACAD SCI, V101, P627

[3] LOW-ENERGY ELECTRON-DIFFRACTION STUDY OF MOLYBDENUM (110) SURFACES [J].

HAAS, TW ;

JACKSON, AG .

JOURNAL OF CHEMICAL PHYSICS, 1966, 44 (08) :2921-&

[4] ADSORPTION ON NIOBIUM (110) TANTALUM (110) AND VANADIUM (110) SURFACES [J].

HAAS, TW ;

JACKSON, AG ;

HOOKER, MP .

JOURNAL OF CHEMICAL PHYSICS, 1967, 46 (08) :3025-&

[5]

HANSEN M, 1958, CONSTITUTION BINARY, P57

[6] LEED OBSERVATIONS OF CALIBRATED EPITAXIAL NICKEL FILMS ON (111) COPPER) [J].

HAQUE, CA ;

FARNSWORTH, HE .

SURFACE SCIENCE, 1966, 4 (02) :195-+

[7] OXIDATION OF TANTALUM COATED WITH ALUMINUM AND ALUMINUM-CHROMIUM ALLOYS [J].

KOFSTAD, P ;

ESPEVIK, S .

JOURNAL OF THE LESS-COMMON METALS, 1967, 12 (02) :117-&

[8] LOW ENERGY ELECTRON DIFFRACTION STUDY OF (3) DIAMOND SURFACE [J].

LANDER, JJ ;

MORRISON, J .

SURFACE SCIENCE, 1966, 4 (03) :241-&

[9] SURFACE REACTIONS OF SILICON (3) WITH ALUMINUM AND INDIUM [J].

LANDER, JJ ;

MORRISON, J .

JOURNAL OF APPLIED PHYSICS, 1965, 36 (05) :1706-&

[10] SURFACE REACTIONS OF SILICON WITH ALUMINUM AND WITH INDIUM [J].

LANDER, JJ ;

MORRISON, J .

SURFACE SCIENCE, 1964, 2 :553-565

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