NANOTRIBOLOGY - AN UHV-SFM STUDY ON THIN-FILMS OF C-60 AND AGBR

被引:71
作者
LUTHI, R
MEYER, E
HAEFKE, H
HOWALD, L
GUTMANNSBAUER, W
GUGGISBERG, M
BAMMERLIN, M
GUNTHERODT, HJ
机构
[1] Institute of Physics, University of Basel, CH-4056 Basel
关键词
D O I
10.1016/0039-6028(95)00589-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We performed scanning force microscopy (SFM) in ultrahigh vacuum (UHV) on C60 and AgBr thin films deposited on NaCl(001) substrates. The morphology of the initial growth stage and the nanotribological properties of these thin films are characterized and discussed. A novel experimental approach is presented where local friction coefficients are determined: the lateral (frictional) forces are measured as a function of normal load, controlled by an external ramp generator. The local friction coefficient can be extracted by means of the two-dimensional histogram technique. In the low load regime, friction coefficients of 0.15 +/- 0.02, 0.33 +/- 0.07 and < 0.03 were found between probing SiOx tip and C60, AgBr and NaCl, respectively. The two-dimensional histogram reveals significant details about the force regime of wear-less friction and the initial stage of wear on these thin films.
引用
收藏
页码:247 / 260
页数:14
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