THE ELECTROSTATIC POTENTIALS IN AN ELECTRON-CYCLOTRON-RESONANCE PROCESSING PLASMA

被引：2

作者：

ASHTIANI, KA ^{[1
]}

SHOHET, JL ^{[1
]}

ANDERSON, FSB ^{[1
]}

ANDERSON, DT ^{[1
]}

FRIEDMANN, JB ^{[1
]}

机构：

[1] UNIV WISCONSIN,TORSATRON STELLARATOR LAB,MADISON,WI 53706

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1992年 / 12卷 / 02期

关键词：

ELECTROSTATIC POTENTIALS; ELECTRON-CYCLOTRON RESONANCE; MAGNETIC MIRROR; EMISSIVE PROBES;

D O I：

10.1007/BF01447444

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

The axial distribution of the electrostatic potentials of an electron-cyclotron resonance (ECR) processing plasma confined in a dc magnetic mirror geometry was characterized. The potential profiles for argon and helium at 8.0 x 10(-4) and 4.0 x 10(-4) Torr were measured using electron emissive probes. The experimental measurements were then compared with the predictions of a one-dimensional, electrostatic, particle-in-cell computer code which runs on a personal computer. The potential profiles as predicted by the code showed good agreement with the experimental measurements.

引用

页码：161 / 175

页数：15

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