ASSESSING THE CORROSION-RESISTANCE OF NONEQUILIBRIUM MAGNESIUM-YTTRIUM ALLOYS

被引:65
作者
MILLER, PL [1 ]
SHAW, BA [1 ]
WENDT, RG [1 ]
MOSHIER, WC [1 ]
机构
[1] MARTIN MARIETTA ASTRONAUT GRP,DENVER,CO 80201
关键词
CHLORIDE; LOCALIZED CORROSION; MAGNESIUM ALLOYS; PITTING; PASSIVITY; POTENTIODYNAMIC POLARIZATION; SODIUM CHLORIDE; SPUTTER DEPOSITION; THIN-FILM ALLOYS; X-RAY DIFFRACTION; YTTRIUM;
D O I
10.5006/1.3293568
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Magnesium-yttrium (Mg-Y) alloys containing 7 at% to 26 at% solute were fabricated using magnetron cosputter deposition. X-ray diffraction (XRD) revealed that no second phases were present in any of the alloys and that all but two of the alloys (Mg-7% Y and Mg-14% Y) were nanocrystalline and/or amorphous. Anodic potentiodynamic polarization performed in 0.1 M sodium chloride (NaCl) at both near-neutral and high pH values showed improved anodic polarization behavior for most of the alloys when compared to either pure Mg or one of the most corrosion-resistant commercial Mg alloys (alloy WE43 [UNS M18430]). In the high-pH solution, it was not uncommon for breakdown potentials (E(b)) of the Mg-Y alloys to be 2,000 mV higher than values for alloy WE43. Long-term galvanic and potentiostatic testing was performed on selected alloys to verify anodic polarization behavior Potentiostatic testing also was performed in a pH 12 buffer solution. When defects did not affect corrosion behavior, low current density values were obtained, with one specimen exhibiting a current density of 0.9 mu A/cm(2) (5.8 mu A/in.(2)) at a potential > 300 mV(SCE). X-ray photoelectron spectroscopy (XPS) conducted on Mg-22% Y revealed Y was enriched significantly in the passive film once the alloy was immersed in solution. This presence of oxidized Y in the passive film was believed to be responsible for the exceptional corrosion resistance of these alloys.
引用
收藏
页码:922 / 931
页数:10
相关论文
共 35 条
[1]  
AHMED DS, 1990, MATER SCI TECH SER, V6, P469, DOI 10.1179/026708390790190928
[2]  
CHANG CF, 1989, LIGHT METAL AGE, V23
[3]  
CLARK KJ, 1986, 4ORD P WORLD MAGN C, P26
[4]  
Cullity B.D., 1978, ELEMENTS XRAY DIFFRA, P87
[5]  
DAS SK, 1985, P TMS AIME NE REGION, P137
[6]   PASSIVE FILM STRUCTURE OF SUPERSATURATED AL-MO ALLOYS [J].
DAVIS, GD ;
MOSHIER, WC ;
LONG, GG ;
BLACK, DR .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (11) :3194-3199
[7]   EVOLUTION OF THE CHEMISTRY OF PASSIVE FILMS OF SPUTTER-DEPOSITED, SUPERSATURATED AL-ALLOYS [J].
DAVIS, GD ;
MOSHIER, WC ;
FRITZ, TL ;
COTE, GO .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (02) :422-427
[8]   PITTING OF SPUTTERED ALUMINUM-ALLOY THIN-FILMS [J].
FRANKEL, GS ;
RUSSAK, MA ;
JAHNES, CV ;
MIRZAMAANI, M ;
BRUSIC, VA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (04) :1243-1244
[9]  
HACK HP, 1987, METALS HDB, V13, P234
[10]  
Hanawalt JD, 1942, T AM I MIN MET ENG, V147, P273