FRUSTRATION IN THE SI(111) PSEUDO 5 X 5 CU STRUCTURE DIRECTLY OBSERVED BY SCANNING TUNNELING MICROSCOPY

被引:41
作者
MORTENSEN, K [1 ]
机构
[1] AARHUS UNIV,INST PHYS,DK-8000 AARHUS,DENMARK
关键词
D O I
10.1103/PhysRevLett.66.461
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Frustration in a surface structure has been observed in real space and time using the scanning tunneling microscope. The frustration is revealed as an instability of an inherent feature in the Si(111) "pseudo 5 x 5" Cu structure. A possible origin of the frustration is proposed.
引用
收藏
页码:461 / 464
页数:4
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