DEGRADATION OF DOPED SI REGIONS CONTACTED WITH TRANSITION-METAL SILICIDES DUE TO METAL-DOPANT COMPOUND FORMATION

被引：60

作者：

MAEX, K

DEKEERSMAECKER, RF

GHOSH, G

DELAEY, L

PROBST, V

机构：

[1] CATHOLIC UNIV LEUVEN,DEPT MET & MAT ENGN,B-3030 HEVERLE,BELGIUM

[2] SIEMENS AG,CORP RES & DEV,D-8000 MUNICH,FED REP GER

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 11期

关键词：

D O I：

10.1063/1.343724

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5327 / 5334

页数：8

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