PHOTO-EXCITED ETCHING OF POLYCRYSTALLINE AND SINGLE-CRYSTALLINE SILICON IN CL2 ATMOSPHERE

被引:70
作者
OKANO, H
HORIIKE, Y
SEKINE, M
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1985年 / 24卷 / 01期
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D O I
10.1143/JJAP.24.68
中图分类号
O59 [应用物理学];
学科分类号
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页码:68 / 74
页数:7
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