HIGH-RATE DEPOSITION OF FERRITE FILMS IN AQUEOUS-SOLUTION BY LIGHT-ENHANCED FERRITE PLATING

被引：3

作者：

ITOH, T ^{[1
]}

HORI, S ^{[1
]}

ABE, M ^{[1
]}

TAMAURA, Y ^{[1
]}

机构：

[1] TOKYO INST TECHNOL, DEPT CHEM, MEGURO KU, TOKYO 152, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1990年 / 29卷 / 08期

关键词：

Aqueous solution; Fe[!sub]3[!/sub]O[!sub]4[!/sub; Ferrite; Light-enhanced plating; Plating; Thin film;

D O I：

10.1143/JJAP.29.L1458

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

By irradiating the substrate surface with a Xe-lamp at 450 W/cm2, the deposition rate of Fe3O4film in ferrite plating was increased by a factor of 10 (from ∼30 nm/min to ∼320 nm/min). The high deposition rate in light-enhanced ferrite plating cannot be simply ascribed to the increase of thermal energy. © 1990 IOP Publishing Ltd.

引用

页码：L1458 / L1459

页数：2

共 8 条

[1] HIGH-SPEED DEPOSITION OF HIGH-QUALITY FERRITE FILMS FROM AQUEOUS-SOLUTION AT LOW-TEMPERATURES (LESS-THAN-OR-EQUAL-TO-90-DEGREES-C) [J].