THE INFLUENCE OF ELECTRODE-FLUORINE REACTIONS ON CORONA AND GLOW-DISCHARGES IN SF6

被引:20
作者
MACGREGOR, SJ [1 ]
WOOLSEY, GA [1 ]
OGLE, DB [1 ]
FARISH, O [1 ]
机构
[1] UNIV NEW ENGLAND,DEPT PHYS,ARMIDALE,NSW 2351,AUSTRALIA
关键词
D O I
10.1109/TPS.1986.4316586
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
引用
收藏
页码:538 / 543
页数:6
相关论文
共 22 条
[1]  
CANNON WA, 1968, T METALL SOC AIME, V242, P1635
[2]   RECENT ADVANCES IN GASEOUS DIELECTRICS AT OAK-RIDGE-NATIONAL-LABORATORY [J].
CHRISTOPHOROU, LG ;
SAUERS, I ;
JAMES, DR ;
RODRIGO, H ;
PACE, MO ;
CARTER, JG ;
HUNTER, SR .
IEEE TRANSACTIONS ON ELECTRICAL INSULATION, 1984, 19 (06) :550-566
[3]   PLASMA-ETCHING OF SI AND SIO2 IN SF6-O2 MIXTURES [J].
DAGOSTINO, R ;
FLAMM, DL .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (01) :162-167
[4]   AN INTERFEROMETRIC MEASUREMENT OF GAS TEMPERATURES IN CORONA DISCHARGES [J].
DOUGLAS, NG ;
FALCONER, IS ;
LOWKE, JJ .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1982, 15 (04) :665-668
[5]   SF6, A PREFERABLE ETCHANT FOR PLASMA-ETCHING SILICON [J].
EISELE, KM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (01) :123-126
[6]  
EMELEUS KG, 1938, P R IRISH ACAD A, V44, P87
[7]   COMPOSITION AND TRANSPORT PROPERTIES OF SE6 AND THEIR USE IN A SIMPLIFIED ENTHALPY FLOW ARC MODEL [J].
FROST, LS ;
LIEBERMA.RW .
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1971, 59 (04) :474-&
[8]  
GILLARDEAU J, 1967, CEAR3212 COM EN AT R
[9]  
GUNTHER WH, 1966, ANL7241 US AT EN COM
[10]   ELECTRON-ATTACHMENT TO THE PERFLUOROALKANES N-CNF2N+2(N=1-6) USING HIGH-PRESSURE SWARM TECHNIQUES [J].
HUNTER, SR ;
CHRISTOPHOROU, LG .
JOURNAL OF CHEMICAL PHYSICS, 1984, 80 (12) :6150-6164