DETERMINATION OF ENERGY AND MASS DISTRIBUTIONS OF IONS AND NEUTRAL PARTICLES IN MAGNETRON-IONPLATING

Energy distributions are presented of the ions produced in a magnetron plasma source which hit the negatively biased substrate surface thus getting deeper insight into the coating process. By observing the mass analysed fluxes and the energy distributions of the impinging particles it is found that practically only atomic ions and atomic neutrals arrive at the substrate and contribute to the growth of the film.