HYDROGEN-ATOM YIELD IN RF AND MICROWAVE HYDROGEN DISCHARGES

被引:81
作者
STONGE, L
MOISAN, M
机构
[1] Département de Physique, Université de Montréal, Montréal, H3C 3J7, Québec
关键词
HYDROGEN ATOMS; H-2; DISCHARGES; PARTICLE BALANCE MODEL; ACTINOMETRY; ATOM RECOMBINATION; WALL COOLING; DIMETHYL POLYSILOXANE; DIAMOND;
D O I
10.1007/BF01465741
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
The hydrogen atom yield in pure-H-2 RF and microwave-sustained discharges is investigated both theoretically and experimentally. A particle balance model is developed that provides the concentrations of the H, H-2, H+, H-2+, and H-3+ species. It is also shown that an approximate solution of this model is adequate for calculating the concentration of H atoms (required, for instance, in diamond film deposition) in the 0.1-10 torr range. Next, the validity of the actinometry technique applied to the determination of the H-atom density in pure-H-2 discharges is examined Using this diagnostic, it is observed that the H-atom concentration decreases when the vessel wall temperature increases, owing to the increased efficiency of atomic hydrogen recombination on the wall. To overcome this effect, the discharge tube wall is cooled off with dimethylpolysiloxane, a low-loss dielectric liquid. It improves significantly the H-atom concentration at 2450 MHz provided the pressure is typically below a few torr and the power density is not too high.
引用
收藏
页码:87 / 116
页数:30
相关论文
共 55 条
[1]   LOW-PRESSURE, METASTABLE GROWTH OF DIAMOND AND DIAMONDLIKE PHASES [J].
ANGUS, JC ;
HAYMAN, CC .
SCIENCE, 1988, 241 (4868) :913-921
[2]  
[Anonymous], 1973, MOBILITY DIFFUSION I
[3]  
ANTHONY T, 1990, PHYSICS CHEM CARBIDE, P133
[4]  
BACHMANN PK, 1988, JUL P DIAM TECHN IN
[5]   CRYSTALLIZATION OF DIAMOND FROM THE GAS-PHASE .1. [J].
BADZIAN, AR ;
DEVRIES, RC .
MATERIALS RESEARCH BULLETIN, 1988, 23 (03) :385-400
[6]   MODEL FOR DISSOCIATION OF HYDROGEN IN AN ELECTRIC-DISCHARGE [J].
BELL, AT .
INDUSTRIAL & ENGINEERING CHEMISTRY FUNDAMENTALS, 1972, 11 (02) :209-&
[7]   KINETIC CALCULATIONS IN PLASMAS USED FOR DIAMOND DEPOSITION [J].
BOU, P ;
BOETTNER, JC ;
VANDENBULCKE, L .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (5A) :1505-1513
[8]   KINETICS OF CHEMICAL-REACTIONS IN HYDROCARBON-HYDROGEN PLASMAS FOR DIAMOND DEPOSITION [J].
BOU, P ;
BOETTNER, JC ;
VANDENBULCKE, L .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (9A) :2931-2936
[9]   INFRARED DETECTION OF GASEOUS SPECIES DURING THE FILAMENT-ASSISTED GROWTH OF DIAMOND [J].
CELII, FG ;
PEHRSSON, PE ;
WANG, HT ;
BUTLER, JE .
APPLIED PHYSICS LETTERS, 1988, 52 (24) :2043-2045
[10]   OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY [J].
COBURN, JW ;
CHEN, M .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) :3134-3136