2-PHOTON PROCESSES IN DEFECT FORMATION BY EXCIMER LASERS IN SYNTHETIC SILICA GLASS

被引：144

作者：

ARAI, K

IMAI, H

HOSONO, H

ABE, Y

IMAGAWA, H

机构：

[1] NAGOYA INST TECHNOL,SHOWA KU,NAGOYA,AICHI 466,JAPAN

[2] TOYO UNIV,KAWAGOE,SAITAMA 350,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 20期

关键词：

D O I：

10.1063/1.100362

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1891 / 1893

页数：3

共 11 条

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[6]

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[8] PHOTOINDUCED PARAMAGNETIC DEFECTS IN AMORPHOUS-SILICON DIOXIDE [J].

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KASTNER, MA .

PHYSICAL REVIEW B, 1984, 29 (12) :7079-7081

[9]

STATHIS JH, 1986, DEFECTS GLASSES, V61, P161

[10]

TAYLOR AJ, 1988, APR C LAS EL AN

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