X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF GAAS (001) SURFACE THERMOCLEANING PRIOR TO MOLECULAR-BEAM EPITAXY

被引:25
作者
CONTOUR, JP [1 ]
MASSIES, J [1 ]
SALETES, A [1 ]
STAIB, P [1 ]
机构
[1] ISA RIBER,F-92503 RUEIL MALMAISON,FRANCE
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1985年 / 38卷 / 01期
关键词
D O I
10.1007/BF00618725
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:45 / 47
页数:3
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