BIASED SECONDARY-ELECTRON IMAGING STUDIES OF AG/SI(111)

被引：16

作者：

DOUST, T ^{[1
]}

METCALFE, FL ^{[1
]}

VENABLES, JA ^{[1
]}

机构：

[1] UNIV SUSSEX,SCH MATH & PHYS SCI,BRIGHTON BN1 9QH,E SUSSEX,ENGLAND

来源：

ULTRAMICROSCOPY | 1989年 / 31卷 / 01期

关键词：

D O I：

10.1016/0304-3991(89)90041-7

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：116 / 123

页数：8

共 20 条

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[7] SEM OBSERVATIONS OF AG SURFACE-DIFFUSION AT THE SI(111) SQUARE-ROOT-3-AG INTERFACE [J].

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