INTERFACIAL STRUCTURE OF TUNGSTEN LAYERS FORMED BY SELECTIVE LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION

被引：70

作者：

STACY, WT

BROADBENT, EK

NORCOTT, MH

机构：

来源：

关键词：

D O I：

10.1149/1.2113862

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：444 / 448

页数：5

共 15 条

[1] CATALYTIC GASIFICATION OF GRAPHITE BY BIMETALLIC PARTICLES
BAKER, RTK
SHERWOOD, RD
DUMESIC, JA
[J]. JOURNAL OF CATALYSIS, 1980, 62 (02) : 221 - 230
[2] INSITU ELECTRON-MICROSCOPY STUDIES OF CATALYST PARTICLE BEHAVIOR
BAKER, RTK
[J]. CATALYSIS REVIEWS-SCIENCE AND ENGINEERING, 1979, 19 (02): : 161 - 209
[3] CATALYTIC GASIFICATION OF GRAPHITE BY NICKEL IN VARIOUS GASEOUS ENVIRONMENTS
BAKER, RTK
SHERWOOD, RD
[J]. JOURNAL OF CATALYSIS, 1981, 70 (01) : 198 - 214
[4] BAKER RTK, 1979, J CATAL, V41, P22
[5] SELECTIVE LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN
BROADBENT, EK
RAMILLER, CL
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (06) : 1427 - 1433
[6] DEBLASI J, 1984, ELECTROCHEMICAL SOC, V842, P7
[7] GARGINI P, 1981, ELECTROCHEMICAL SOC, V812, P924
[8] GARGINI PA, 1981, 1981 INT EL DEV M, P54
[9] GARGINI PA, 1983, IND RES DEV MAR, P142
[10] IONIZATION PROCESSES ON TUNGSTEN FILAMENTS .2. THE ABSORPTION OF FLUORINE ON TUNGSTEN
METLAY, M
KIMBALL, GE
[J]. JOURNAL OF CHEMICAL PHYSICS, 1948, 16 (08) : 779 - 781