CORRELATION BETWEEN LEWIS DONOR-ACCEPTOR PROPERTIES DETERMINED BY XPS AND BRONSTED ACID-BASE PROPERTIES DETERMINED BY REST-POTENTIAL MEASUREMENTS, FOR ALUMINUM AND SILICON-OXIDES

被引:11
作者
CASAMASSIMA, M
DARQUECERETTI, E
ETCHEBERRY, A
AUCOUTURIER, M
机构
[1] CNRS,ELECTROCHIM INTERFACIALE LAB,F-92195 MEUDON,FRANCE
[2] CNRS,PHYS SOLIDES LAB,F-92195 MEUDON,FRANCE
关键词
D O I
10.1007/BF00351220
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In order to qualify the reactivity of various aluminium and silicon oxide substrates for elastomer adhesion applications, X-ray photoelectron spectroscopy (XPS) and rest-electrochemical potential measurements have been performed on those surfaces. The interpretation of XPS binding energy shift measurements in terms of Fermi level variation from one surface to another, as proposed by Mullins and Averbach in 1988, is discussed in view of results on an aluminosilicate compound surface. The correlation with electrochemical rest-potential measurements on an anodized aluminium surface and a silane coupling agent is described and discussed. The possibility of surface reactivity assessment through correlated XPS and electrochemical measurements for metal oxides is demonstrated.
引用
收藏
页码:3997 / 4002
页数:6
相关论文
共 13 条
[1]   QUANTUM-MECHANICAL APPROACH TO UNDERSTANDING ACID-BASE INTERACTIONS AT METAL POLYMER INTERFACES [J].
CAIN, SR .
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 1990, 4 (04) :333-351
[2]   ACID-BASE BEHAVIOR OF ALUMINUM AND SILICON-OXIDES - A COMBINATION OF 2 APPROACHES - XPS AND LEWIS ACIDO-BASICITY - REST POTENTIAL AND BRONSTED ACIDO-BASICITY [J].
CASAMASSIMA, M ;
DARQUECERETTI, E ;
ETCHEBERRY, A ;
AUCOUTURIER, M .
APPLIED SURFACE SCIENCE, 1991, 52 (03) :205-213
[3]  
Fowkes F. M., 1987, J ADHES SCI TECHNOL, V1, P7, DOI [10.1163/156856187X00049, DOI 10.1163/156856187X00049]
[4]   THE LEWIS ACID-BASE CONCEPTS - RECENT RESULTS AND PROSPECTS FOR THE FUTURE [J].
JENSEN, WB .
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 1991, 5 (01) :1-21
[5]   RELEVANCE OF THE DENSITY-FUNCTIONAL THEORY TO ACID-BASE INTERACTIONS AND ADHESION IN SOLIDS [J].
LEE, LH .
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 1991, 5 (01) :71-92
[6]   DEPENDENCE OF THE BAND BENDING OF THE OXIDE SEMICONDUCTORS ON PH [J].
MATSUMOTO, Y ;
YOSHIKAWA, T ;
SATO, E .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (05) :1389-1391
[7]   THE ELECTRONIC-STRUCTURE OF ANODIZED AND ETCHED ALUMINUM-ALLOY SURFACES [J].
MULLINS, WM ;
AVERBACH, BL .
SURFACE SCIENCE, 1988, 206 (1-2) :52-60
[8]   SURFACE-PROPERTIES OF SILICON AND ALUMINUM-OXIDE POWDERS [J].
MULLINS, WM ;
AVERBACH, BL .
SURFACE SCIENCE, 1988, 206 (1-2) :41-51
[9]   ACIDIC AND BASIC SITES OF MAIN GROUP MIXED METAL-OXIDES [J].
NOLLER, H ;
LERCHER, JA ;
VINEK, H .
MATERIALS CHEMISTRY AND PHYSICS, 1988, 18 (5-6) :577-593
[10]  
STELOW WH, 1973, J PHYS CHEM REF DATA, V2, P169