X-RAY-LITHOGRAPHY - AN OVERVIEW AND RECENT ACTIVITIES AT SUPER-AGO

被引：2

作者：

ROUSSEAUX, F

HAGHIRIGOSNET, AM

CHEN, Y

RAVET, MF

LAUNOIS, H

机构：

[1] Lab de Microstructures et de, Microelectronique, Bagneux

来源：

JOURNAL DE PHYSIQUE IV | 1994年 / 4卷 / C9期

关键词：

D O I：

10.1051/jp4:1994942

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

In this paper, the current status of synchrotron based XRL is discussed in view to present this technic as an alternative path to ultra-large-scale-integrated circuit (ULSI) with feature sizes of quarter micrometer and below. Also, are described the L2M laboratory activities in nanomask fabrication and nanolithography using the synchrotron radiation of Super-AGO. Results show that the range of 50 nm can be currently achieved. Examples of device nano-fabrication are given.

引用

页码：237 / 244

页数：8

共 30 条

[1] A STUDY OF THE EFFECT OF KEY PROCESSING VARIABLES ON THE LITHOGRAPHIC PERFORMANCE OF MICROPOSIT SAL601-ER7 RESIST
BLUM, L
PERKINS, ME
LIU, HY
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2280 - 2285
[2] CHEN Y, 1994, MICROELECTRONIC ENG, V23
[3] DAMMEL R, 1993, SPIE PRESS, V11
[4] DEGUCHI K, 1993, J PHOTOPOLYM SCI TEC, V6, P445
[5] DOBISZ EA, 1993, MATER RES SOC SYMP P, V306, P3, DOI 10.1557/PROC-306-3
[6] DIFFRACTION IN PROXIMITY X-RAY-LITHOGRAPHY - COMPARING THEORY AND EXPERIMENT FOR GRATINGS, LINES, AND SPACES
EARLY, K
SCHATTENBURG, ML
OLSTER, DB
SHEPARD, MI
SMITH, HI
[J]. MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 149 - 152
[7] X-RAY-LITHOGRAPHY AT - 100-A LINEWIDTHS USING X-RAY MASKS FABRICATED BY SHADOWING TECHNIQUES
FLANDERS, DC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1615 - 1619
[8] OVERLAY PERFORMANCE OF AN ADVANCED X-RAY STEPPER (XRS 200)
GABELI, F
KUCINSKI, A
SIMON, K
SCHEUNEMANN, HU
[J]. MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 203 - 208
[9] A STUDY OF THE EFFECT OF COMPOSITION ON THE MICROSTRUCTURAL EVOLUTION OF A-SIXCL-X - H PECVD FILMS - IR ABSORPTION AND XPS CHARACTERIZATIONS
GAT, E
ELKHAKANI, MA
CHAKER, M
JEAN, A
BOILY, S
PEPIN, H
KIEFFER, JC
DURAND, J
CROS, B
ROUSSEAUX, F
GUJRATHI, S
[J]. JOURNAL OF MATERIALS RESEARCH, 1992, 7 (09) : 2478 - 2487
[10] GUO JZ, 1992, J VAC SCI TECHNOL B, V10

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