FINE PATTERNS OF POSITIVE-WORKING RESISTS USING A POLYIMIDE LANGMUIR-BLODGETT-FILM SYSTEM

被引:4
作者
IWAMOTO, M
KASAHARA, S
IRIYAMA, K
NISHIKATA, Y
KAKIMOTO, M
IMAI, Y
机构
[1] FUJITSU LTD,DIV BASIC PROC DEV,NAKAHARA KU,KAWASAKI 221,JAPAN
[2] JIKEI UNIV,INST MED SCI,DIV BIOCHEM,TOKYO 105,JAPAN
[3] TOKYO INST TECHNOL,DEPT ORGAN & POLYMER MAT,MEGURO KU,TOKYO 152,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1991年 / 30卷 / 2A期
关键词
LANGMUIR; BLODGETT FILMS; POLYIMIDE; POSITIVE; RESIST; DISILANE; KRF EXCIMER LASER; POSITIVE-WORKING RESIST;
D O I
10.1143/JJAP.30.L218
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thermally stable multilayer films of polyimide containing photosensitive disilane unit were applied to KrF excimer laser resists. The multilayer films prepared by the Langmuir-Blodgett technique were found to act as positive working resists with a resolution of 0.25-mu-m lines and spaces.
引用
收藏
页码:L218 / L221
页数:4
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