DIFFUSION OF GE IN SIGE ALLOYS

[1] Askill J., 1970, TRACER DIFFUSION DAT, DOI [10.1007/978-1-4684-6075-9, DOI 10.1007/978-1-4684-6075-9]

[2] DISMUKES JP, 1965, T METALL SOC AIME, V233, P672

[3] SELF-DIFFUSION IN INTRINSIC AND EXTRINSIC SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (08) : 3148 - &

[4] ELECTRONIC STRUCTURE OF PRIMARY SOLID SOLUTIONS IN METALS [J]. ADVANCES IN PHYSICS, 1954, 3 (12) : 446 - 507

[5] GOSHTAGORE RN, 1966, PHYS REV LETT, V16, P890

[6] KENDALL DL, 1969, SEMICONDUCTOR SILICO

[7] SELF-DIFFUSION IN GERMANIUM [J]. PHYSICAL REVIEW, 1956, 102 (03): : 636 - 639

[8] SILICON SELF-DIFFUSION - (CZOCHRALSKI SINGLE CRYSTAL - SI31 - TEMPERATURE DEPENDENCE - ACTIVATION ENERGY 118.5 KCAL/MOLE - 1100 TO 1300 DEGREES C - E) [J]. APPLIED PHYSICS LETTERS, 1966, 8 (11) : 280 - +

[9] MEASUREMENT OF ELASTIC CONSTANTS AT LOW TEMPERATURES BY MEANS OF ULTRASONIC WAVES - DATA FOR SILICON AND GERMANIUM SINGLE CRYSTALS, AND FOR FUSED SILICA [J]. JOURNAL OF APPLIED PHYSICS, 1953, 24 (08) : 988 - 997

[10] DIFFUSION OF GERMANIUM IN SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (03) : 1409 - 1410

[1] Askill J., 1970, TRACER DIFFUSION DAT, DOI [10.1007/978-1-4684-6075-9, DOI 10.1007/978-1-4684-6075-9]

[2] DISMUKES JP, 1965, T METALL SOC AIME, V233, P672

[3] SELF-DIFFUSION IN INTRINSIC AND EXTRINSIC SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (08) : 3148 - &

[4] ELECTRONIC STRUCTURE OF PRIMARY SOLID SOLUTIONS IN METALS [J]. ADVANCES IN PHYSICS, 1954, 3 (12) : 446 - 507

[5] GOSHTAGORE RN, 1966, PHYS REV LETT, V16, P890

[6] KENDALL DL, 1969, SEMICONDUCTOR SILICO

[7] SELF-DIFFUSION IN GERMANIUM [J]. PHYSICAL REVIEW, 1956, 102 (03): : 636 - 639

[8] SILICON SELF-DIFFUSION - (CZOCHRALSKI SINGLE CRYSTAL - SI31 - TEMPERATURE DEPENDENCE - ACTIVATION ENERGY 118.5 KCAL/MOLE - 1100 TO 1300 DEGREES C - E) [J]. APPLIED PHYSICS LETTERS, 1966, 8 (11) : 280 - +

[9] MEASUREMENT OF ELASTIC CONSTANTS AT LOW TEMPERATURES BY MEANS OF ULTRASONIC WAVES - DATA FOR SILICON AND GERMANIUM SINGLE CRYSTALS, AND FOR FUSED SILICA [J]. JOURNAL OF APPLIED PHYSICS, 1953, 24 (08) : 988 - 997

[10] DIFFUSION OF GERMANIUM IN SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (03) : 1409 - 1410