ELECTRONIC INSTABILITIES IN TRANSITION-METAL DOPED AMORPHOUS-SILICON DIOXIDE FILMS

被引：3

作者：

KRISHNA, KV

DELIMA, JJ

OWEN, AE

机构：

[1] Univ of Edinburgh, Edinburgh, Scotl, Univ of Edinburgh, Edinburgh, Scotl

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1985年 / 77-8卷

关键词：

ACKNOWLEDGEMENTS The authors wish to acknowledge the financial assistance from the Science and Engineering Research Council. One of the authors (JJD) would like to express his thanks to Hughes Microelectronics Ltd. for a CASE studentship;

D O I：

10.1016/0022-3093(85)90902-0

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1321 / 1324

页数：4

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