STEP-FLOW GROWTH ON STRAINED SURFACES

被引:32
作者
RATSCH, C
ZANGWILL, A
机构
[1] School of Physics, Georgia Institute of Technology, Atlanta
关键词
D O I
10.1063/1.110522
中图分类号
O59 [应用物理学];
学科分类号
摘要
A theoretical study is presented of the effect of misfit strain on the transition from step flow to island nucleation dominated epitaxial layer growth on a vicinal surface. The analysis generalizes a set of reaction-diffusion equations used for homoepitaxy to include the fact that heteroepitaxial strain changes the Arrhenius barrier for diffusion and promotes the detachment of atoms from the edge of strained terraces and islands. The first effect is equivalent to changing the deposition flux; the latter can drive the system into a new layer growth mode characterized by moving steps that engulf very many very small islands. Experiments to test these predictions are suggested.
引用
收藏
页码:2348 / 2350
页数:3
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