CHEMISORPTION OF ATOMIC AND MOLECULAR-OXYGEN ON THE (100) SURFACE OF SILICON - A THEORETICAL-STUDY

被引：28

作者：

BARONE, V ^{[1
]}

LELJ, F ^{[1
]}

RUSSO, N ^{[1
]}

TOSCANO, M ^{[1
]}

机构：

[1] UNIV CALABRIA,DIPARTIMENTO CHIM,I-87030 COSENZA,ITALY

来源：

SURFACE SCIENCE | 1985年 / 162卷 / 1-3期

关键词：

D O I：

10.1016/0039-6028(85)90900-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：230 / 238

页数：9

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