RANGE PARAMETERS OF HEAVY-IONS IMPLANTED INTO BE FILMS

被引：23

作者：

GRANDE, PL

BEHAR, M

BIERSACK, JP

ZAWISLAK, FC

机构：

[1] Instituto de Fisica, UFRGS, 91500 Porto Alegre, RS

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1990年 / 45卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(90)90925-K

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Range profiles of Bi, Pb, Eu, Cs and Cu implanted into Be films at energies from 20 to 300 keV, have been determined using Rutherford backscattering analysis. Comparison of the experimental results with the Monte Carlo TRIM calculations shows: (1) the Bi, Pb and Cu ranges in Be are larger than the predicted ones, the discrepancies being about 25%, (2) the Eu, Cs and Rb ranges are reproduced quite well by the calculations. © 1990.

引用

页码：689 / 692

页数：4

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