DEPOSITION OF PBTIO3 FILM BY THE SPRAY-ICP TECHNIQUE

被引：12

作者：

ICHINOSE, H ^{[1
]}

NAGANO, M ^{[1
]}

KATSUKI, H ^{[1
]}

TAKAGI, H ^{[1
]}

机构：

[1] SAGA CERAM RES LAB,SAGA 844,JAPAN

来源：

JOURNAL OF MATERIALS SCIENCE | 1994年 / 29卷 / 19期

关键词：

D O I：

10.1007/BF01151104

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

PbTiO3 thin films were prepared on various substrates by spraying an ultrasonically atomized aqueous solution of Pb(NO3)(2) + TiO(NO3)(2) into an inductively coupled plasma (ICP) under atmospheric pressure. Single-phase PbTiO3 with perovskite structure was obtained at 500-650 degrees C. The perovskite obtained below 600 degrees C showed less tetragonality due to the effect of grain size. The PbTiO3 films crystallized with preferred (1 1 1) and (0 0 1) orientations on sapphire (0 0 1) and MgO (1 0 0), respectively. Based on the analysis of ICP emission spectra, it is suggested that a reoxidation of titanium preceded that of lead in the plasma, and also that OH in the plasma played an important role in the deposition of PbTiO3.

引用

页码：5109 / 5114

页数：6

共 25 条

[1] EFFECTS OF THE REACTION PRESSURE ON THE GROWTH OF PBTIO3 THIN-FILMS BY THE PHOTOCHEMICAL VAPOR-DEPOSITION METHOD [J].