ANOMALOUS NEAR-SURFACE EFFECTS IN ROOM-TEMPERATURE IMPLANTED GERMANIUM

被引：9

作者：

LAWSON, EM

SHORT, KT

WILLIAMS, JS

APPLETON, BR

HOLLAND, OW

SCHOW, OE

机构：

[1] ROYAL MELBOURNE INST TECHNOL,MELBOURNE,VIC 3000,AUSTRALIA

[2] OAK RIDGE NATL LAB,OAK RIDGE,TN 37830

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH | 1983年 / 209卷 / MAY期

关键词：

D O I：

10.1016/0167-5087(83)90815-3

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：303 / 307

页数：5

共 9 条

[1]

ANDERSEN HH, 1982, SPUTTERING ION BOMBA

[2] CHARACTERIZATION OF DAMAGE IN ION-IMPLANTED GE [J].

APPLETON, BR ;

HOLLAND, OW ;

NARAYAN, J ;

SCHOW, OE ;

WILLIAMS, JS ;

SHORT, KT ;

LAWSON, E .

APPLIED PHYSICS LETTERS, 1982, 41 (08) :711-712

[3]

APPLETON BR, UNPUB

[4]

GIBBONS JF, 1975, PROJECTED RANGE STAT

[5]

HOLLAND OW, UNPUB

[6]

LAU SS, 1980, HDB SEMICONDUCTORS, V3, pCH8

[7]

Mayer J. W., 1970, ION IMPLANTATION SEM

[8] APPLICATION OF HIGH-RESOLUTION RUTHERFORD BACKSCATTERING TECHNIQUES TO NEAR-SURFACE ANALYSIS [J].

WILLIAMS, JS .

NUCLEAR INSTRUMENTS & METHODS, 1978, 149 (1-3) :207-217

[9] THE EFFECTS OF SELF-ION BOMBARDMENT (30-500 KEV) ON THE SURFACE-TOPOGRAPHY OF SINGLE-CRYSTAL GERMANIUM [J].

WILSON, IH .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) :1698-1705

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