STRESS MEASUREMENT IN THIN-FILMS BY GEOMETRICAL-OPTICS

被引:15
作者
ROSSNAGEL, SM
GILSTRAP, P
RUJKORAKARN, R
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 04期
关键词
D O I
10.1116/1.571863
中图分类号
O59 [应用物理学];
学科分类号
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页码:1045 / 1046
页数:2
相关论文
共 6 条
[1]  
CAMBELL DS, 1962, 9TH T NATL VAC S, P29
[2]  
CAMBELL DS, 1970, HDB THIN FILM TECHNO, P12
[3]  
FINEGAN JD, 1962, 8TH T VAC S 2ND INT, P935
[4]  
GILSTRAP P, COMMUNICATION
[5]   DETERMINATION OF STRESS IN FILMS ON SINGLE CRYSTALLINE SILICON SUBSTRATES [J].
GLANG, R ;
HOLMWOOD, RA ;
ROSENFELD, RL .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1965, 36 (01) :7-+
[6]   INTERNAL-STRESSES IN METALLIC-FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING [J].
THORNTON, JA ;
TABOCK, J ;
HOFFMAN, DW .
THIN SOLID FILMS, 1979, 64 (01) :111-119