ON SI-C CONTAMINATION OF SILICON EPITAXIAL WAFER

被引:12
作者
SATO, K
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D O I
10.1016/0038-1101(64)90032-2
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码:743 / &
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[1]  
ALBERT MP, 1962, J ELECTROCHEM SOC, V104, P709
[2]   INFRARED LATTICE ABSORPTION IN IONIC AND HOMOPOLAR CRYSTALS [J].
LAX, M ;
BURSTEIN, E .
PHYSICAL REVIEW, 1955, 97 (01) :39-52
[3]  
MARK A, 1961, J ELECTROCHEM SOC, V109, P880
[4]  
MERTZ KM, 1960, SILICON CARBIDE, P73
[5]   STRUCTURE DEFECTS IN PYROLTIC SILICON EPITAXIAL FILMS [J].
MILLER, DP ;
MOORE, CR ;
WATELSKI, SB .
JOURNAL OF APPLIED PHYSICS, 1963, 34 (09) :2813-&
[6]  
NEWMAN RC, 1960, 1958 P INT C EL TE 1, V1, P318
[7]   VAPOR-DEPOSITED SINGLE-CRYSTAL GERMANIUM [J].
RUTH, RP ;
MARINACE, JC ;
DUNLAP, WC .
JOURNAL OF APPLIED PHYSICS, 1960, 31 (06) :995-1006
[8]  
SATO K, 1963, J SPECTRO SOC JAPAN, V11, P60
[9]  
SATO K, 1962, J SPECTRO SOC JAPAN, V10, P4
[10]  
SEITZ F, 1940, MODERN THEORY SOLIDS, pCH16