CURRENT DISTRIBUTION DURING ELECTROPLATING WITHIN A TUBULAR ELECTRODE OF HIGH OHMIC RESISTANCE

被引：16

作者：

BENPARAT, M ^{[1
]}

YAHALOM, J ^{[1
]}

RUBIN, E ^{[1
]}

机构：

[1] TECHNION ISRAEL INST TECHNOL,DEPT MAT ENGN,HAIFA,ISRAEL

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 03期

关键词：

D O I：

10.1149/1.2119751

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：559 / 567

页数：9

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