ION-IMPLANTATION OF DEUTERIUM IN TUNGSTEN

被引:38
作者
PISAREV, AA
VARAVA, AV
ZHDANOV, SK
机构
[1] Moscow Engineering Physics Institute, Moscow
关键词
D O I
10.1016/0022-3115(94)00613-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Re-emission, accumulation and thermodesorption of deuterium in tungsten during ion bombardment were investigated in this work. The re-emission rate during ion implantation increased with fluence approaching a stationary level. Re-emission of heterogeneous molecules HD along with D-2 was observed. The quantity of accumulated deuterium increased as a square root of ion fluence at high fluence due to diffusion into bulk. Thermodesorption spectra consisted at least of four peaks with T-m from 350 to 750 K and were presumably connected with deuterium trapped in defects. Re-emission experiments were described by a model taking into account deuterium diffusion, trapping in defects and associative desorption from the surface. The three processes involved were shown to be determined by thermal activation but not irradiation.
引用
收藏
页码:926 / 929
页数:4
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