A STUDY OF AR IMPLANTATION INDUCED DEFECTS IN SIO2

被引：11

作者：

DEVINE, RAB

FERRIEU, F

GOLANSKI, A

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH | 1983年 / 209卷 / MAY期

关键词：

D O I：

10.1016/0167-5087(83)90939-0

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：1201 / 1206

页数：6

共 27 条

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