SUPRALEITUNG VON GERMANIUM UND SILIZIUM UNTER HOHEM DRUCK

[1] Bommel H E, 1963, Science, V139, P1301, DOI 10.1126/science.139.3561.1301-a

[2] Bridgman P., 1952, PROC AM ACAD ART SCI, V81, P165, DOI [10.2307/20023677, DOI 10.2307/20023677]

[3] SUPTALEITUNG DES GALLIUMS BEI HOHEM DRUCK [J]. ZEITSCHRIFT FUR PHYSIK, 1963, 176 (04): : 336 - &

[4] PHASE DIAGRAMS OF SILICON AND GERMANIUM TO 200 KBAR 1000 DEGREE C [J]. JOURNAL OF CHEMICAL PHYSICS, 1964, 41 (12) : 3809 - &

[5] CHESTER PF, 1953, PHILOS MAG, V44, P1281

[6] KENNEDY GC, 1961, PROGRESS VERY HIGH P, P304

[1] Bommel H E, 1963, Science, V139, P1301, DOI 10.1126/science.139.3561.1301-a

[2] Bridgman P., 1952, PROC AM ACAD ART SCI, V81, P165, DOI [10.2307/20023677, DOI 10.2307/20023677]

[3] SUPTALEITUNG DES GALLIUMS BEI HOHEM DRUCK [J]. ZEITSCHRIFT FUR PHYSIK, 1963, 176 (04): : 336 - &

[4] PHASE DIAGRAMS OF SILICON AND GERMANIUM TO 200 KBAR 1000 DEGREE C [J]. JOURNAL OF CHEMICAL PHYSICS, 1964, 41 (12) : 3809 - &

[5] CHESTER PF, 1953, PHILOS MAG, V44, P1281

[6] KENNEDY GC, 1961, PROGRESS VERY HIGH P, P304