ION CLUSTER EMISSION AND DEPOSITION FROM LIQUID GOLD ION SOURCES

被引：29

作者：

DCRUZ, C

POURREZAEI, K

WAGNER, A

机构：

[1] DREXEL UNIV,DEPT ELECT & COMP ENGN,PHILADELPHIA,PA 19104

[2] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

关键词：

D O I：

10.1063/1.336300

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2724 / 2730

页数：7

共 19 条

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MAIR, GLR
[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1980, 13 (11) : 2165 - &
[2] ION PLATING BY FIELD-EMISSION DEPOSITION
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[3] CLAMPITT R, 1978, INT C RAPIDLY QUENCH
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[7] ELECTROHYDRODYNAMIC ION SOURCE
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[J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (13) : 5101 - &
[8] EMISSION FROM LIQUID-METAL ION SOURCES
MAIR, GLR
[J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 172 (03): : 567 - 576
[9] PROPERTIES OF SILICON FILMS PRODUCED BY FIELD-EMISSION DEPOSITION
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PREWETT, PD
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[J]. THIN SOLID FILMS, 1982, 88 (03) : 219 - 224
[10] PEREL J, 1978, RAPID SOLIDIFICATION